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专利名称：Light-transmitting imprinting mold and
method for manufacturing large-area mold
发明人：Yukihiro Miyazawa申请号：US14651765申请日：20140121公开号：US10052798B2公开日：20180821
专利附图：
摘要：An imprint method including the steps of: an exposing step to irradiate a photocuring resin, coated on a large-area substrate, with a curing light while the light-transmitting imprint mold is pressed against the photo curing resin, an amount of the
curing light applied onto the photo curing resin in a light shielding region provided withthe light shielding member made less than an amount of the curing light applied ontothe photo curing resin in a light transmitting region of the mold so that a portion of thephoto curing resin in the light shielding region is semi-cured by the use of the lightshielding member provided so as to reproduce the concave-convex pattern of thetransparent substrate.
申请人：SOKEN CHEMICAL & ENGINEERING Co., Ltd.
地址：Tokyo JP
国籍：JP
代理机构：Maier & Maier, PLLC
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