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专利名称:LIGHT-TRANSMITTING IMPRINTING MOLD
AND METHOD FOR MANUFACTURINGLARGE-AREA MOLD
发明人:Yukihiro MIYAZAWA申请号:US14651765申请日:20140121
公开号:US20150306792A1公开日:20151029
专利附图:
摘要:An imprint method including the steps of: an exposing step to irradiate a photocuring resin, coated on a large-area substrate, with a curing light while the light-
transmitting imprint mold is pressed against the photo curing resin, an amount of thecuring light applied onto the photo curing resin in a light shielding region provided withthe light shielding member made less than an amount of the curing light applied ontothe photo curing resin in a light transmitting region of the mold so that a portion of thephoto curing resin in the light shielding region is semi-cured by the use of the lightshielding member provided so as to reproduce the concave-convex pattern of thetransparent substrate.
申请人:SOKEN CHEMICAL & ENGINEERING CO., LTD.
地址:Tokyo JP
国籍:JP
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