专利内容由知识产权出版社提供
专利名称：ANALYTICAL METHOD AND ANALYTICAL
SYSTEM
发明人：NAKANISHI Hideki,UTANI
Keisuke,NISHIGUCHI Kohei
申请号：EP09806633.5申请日：20090722公开号：EP2312291A1公开日：20110420
专利附图：
摘要：Analytical method and analytical system are presented, wherein properties ofthe carrier gas conveying fine particles and gas components generated by laser ablation
can be prevented from inhibiting the optimization of analysis conditions, and plural kindsof elements can be stably measured with high sensitivity and good accuracy withoutlosing operability, speed, and convenience when fine particles generated by laserablation are plasma-analyzed. A sample αis converted into fine particles by a laserablation device 3 in the atmosphere of a first gas. The fine particles are conveyed fromthe laser ablation device 3 to a gas replacement device 5 by using the first gas as a carriergas. The first gas of at least part of the carrier gas conveying the fine particles is replacedwith a second gas by means of the gas replacement device 5. The fine particles areconveyed from the gas replacement device 5 to the plasma analyzer 6 by the carrier gasthat has been subjected to the gas replacement. Constituent elements of the fineparticles are analyzed by the plasma analyzer 6.
申请人：Sumitomo Seika Chemicals CO. LTD.
地址：346-1, Miyanishi Harima-cho Kako-gun Hyogo 675-0145 JP
国籍：JP
代理机构：Hering, Hartmut
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